| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a protection method for optical elements of a lithographic apparatus. <P>SOLUTION: Deposition gas containing SnH<SB>4</SB>is supplied to the surface of an optical element, and an Sn cap layer is accumulated on the surface of the optical element. In this manner, the Sn cap layer is intentionally accumulated on the optical element, and the optical element in lithographic processing can be protected from the debris of an (Sn) plasma source in the Sn cap layer. During lithographic processing, or after lithographic processing, by having hydrogen radical content gas and/or SnH<SB>4</SB>content gas supplied, the (deteriorated) cap layer can be repaired. Furthermore or alternatively, the (deteriorated) cap layer is removed; and by having the deposition gas containing SnH<SB>4</SB>supplied a new cap layer can be provided. <P>COPYRIGHT: (C)2009,JPO&INPIT |
