| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating apparatus which can uniformly apply a coating liquid to both sides of a substrate to be treated having a center opening by a simple process while preventing the coating liquid from entering into the center opening. SOLUTION: The coating apparatus 1 applies the coating liquid to both principal planes of the substrate 2 to be treated having the center opening 2a, and comprises a rotationally driving mechanism 3 having a chucking part 11 closing the center opening 2a to retain the substrate 2 to be treated, a first coating liquid nozzle 18 jetting the coating liquid to one of the principal plane of the substrate 2 to be treated, a first turn driving mechanism 17 moving the nozzle 18 so as to scan along one of the principal plane of the substrate 2 to be treated, a second coating liquid nozzle 28 jetting the coating liquid to the other principal plane of the substrate 2 to be treated, a second turn driving mechanism 31 moving the nozzle 28 so as to scan along the other principal plane of the substrate 2 to be treated, and a function independently controlling the amount of the coating liquid jetted from a first coating liquid jetting port 23 and the amount of the coating liquid jetted from a second coating liquid jetting port 29. COPYRIGHT: (C)2009,JPO&INPIT
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