| 发明名称 |
Wafer and method for producing a wafer |
| 摘要 |
<p>A wafer includes a wafer frontside surface and a region adjacent to the wafer frontside surface. The region includes oxygen precipitates and the wafer frontside includes a predetermined surface structure to form thereon a device with a desired property.</p> |
| 申请公布号 |
EP2043137(A2) |
申请公布日期 |
2009.04.01 |
| 申请号 |
EP20080014918 |
申请日期 |
2008.08.22 |
| 申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
SCHULZE, HANS-JOACHIM;STRACK, HELMUT;TIMME, HANS-JOERG |
| 分类号 |
H01L21/265;H01L21/322;H01L41/083 |
主分类号 |
H01L21/265 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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