| 摘要 |
There is provided a maintenance method capable of efficiently maintaining an exposure apparatus performing exposure by the liquid immersion method. The method for maintaining the exposure apparatus which exposes a substrate with an exposure light via a projection optical system (PL) and a liquid (1) of an liquid immersion area (AR2) includes: a moving step of arranging a measuring table (MTB) to be opposite to a nozzle member (30) forming the liquid immersion area (AR2); an accumulating step of supplying the liquid (1) onto the measuring table (MTB) by using the nozzle member (30), and accumulating the supplied liquid in a cylinder portion (91); and a cleaning step of jetting the liquid (1) accumulated in the accumulating step from a jet nozzle portion (90) to an area including at least a part of a liquid contact portion, which has a possibility of coming into contact with the liquid (1), during liquid immersion exposure.
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