发明名称 |
A MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM |
摘要 |
<p>The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.</p> |
申请公布号 |
EP2041756(A2) |
申请公布日期 |
2009.04.01 |
申请号 |
EP20070872697 |
申请日期 |
2007.07.16 |
申请人 |
FEI COMPANY |
发明人 |
SMITH, NOEL;CHANDLER, CLIVE D.;UTLAUT, MARK W.;TESCH, PAUL P.;TUGGLE, DAVE |
分类号 |
H01J37/08;C23C14/00;C23C14/22;G21G5/00;H01J27/16;H01J37/30;H01J37/305;H01J37/317;H01J37/32 |
主分类号 |
H01J37/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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