APPARATUS FOR MAKING ETCHING AREA ON SUBSTRATE

摘要

An apparatus for forming an etching region on a substrate is provided to easily perform the loading and unloading process of substrate by forming an isolation space which is able to be opened and closed by the operation of two chamber cases. A chamber part(4) is located in the inside of a frame(2). The chamber part is divided into the first chamber case(C1) and the second chamber case(C2). The first chamber case and the second chamber case are made of the box type including the internal space(S1, S2) having one side which is opened. The first chamber case is combined with the second chamber case by the first driving part (M1). A soft mold(6) is located inside the chamber part. The soft mold is attached to the substrate(G) in the imprint mode. The soft mold has the pattern surface classifying the etched and non-etched regions. The soft mold is located in the enclosure of the chamber part. A stage(10) has the loading plane for loading the substrate.