发明名称 APPARATUS WITH MOBILE BODY, EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
摘要 A moving lattice(30X) is arranged on a side surface of a wafer stage(WST), light is applied to the moving lattice from a light source(22), diffracted light generated at the moving lattice is interfered by fixed scales(24A, 24B) wherein positional relationship with the light source is fixed and an index scale(26), and the interfered light is detected by a detector(28). In such case, since the moving lattice is arranged on the side surface of the wafer stage, size increase of the wafer stage as a whole can be suppressed. Furthermore, since the interference is generated among a plurality of diffracted beams(for instance,± primary diffracted beams) passing extremely close optical paths, there is less influence of fluctuation of the ambient atmosphere compared with the conventional interferometer, highly accurate measurement of position information of the mobile body is made possible.
申请公布号 KR20090033167(A) 申请公布日期 2009.04.01
申请号 KR20087024310 申请日期 2008.10.02
申请人 NIKON CORPORATION 发明人 MAKINOUCHI SUSUMU;IMAI TORU;WATANABE AKIHIRO
分类号 H01L21/027;G01B11/00;G01D5/38;G03F7/20 主分类号 H01L21/027
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