| 摘要 |
Provided is an exposing method for transferring a first pattern to be formed in a first pattern forming region and a second pattern to be formed in a second pattern forming region different from the first pattern forming region, to a substrate by guiding an illumination light passing through the first pattern and the second pattern, to the substrate. The exposing method comprises a first illumination light generating member preparing step (S10) of preparing a first illumination light generating member for generating an illumination light according to illuminating conditions to illuminate the first pattern, a second illumination light generating member preparing step (S11) of preparing a second illumination light generating member for generating an illumination light according to illuminating conditions to illuminate the second pattern, a pattern scanning step of scanning the first pattern, the second pattern and the substrate in a scanning direction with respect to the illumination light, an illumination light generating member scanning step of scanning the first illumination light generating member and the second illumination light generating member in synchronism with the first pattern and the second pattern, and an exposing step (S13) of exposing the first pattern to a first pattern transfer region on the substrate and exposing the second pattern to a second pattern transfer region on the substrate. At the exposing step, the exposure of the first pattern and the exposure of the second pattern are continuously performed. |
