发明名称 APPARATUS FOR CLEANING SUBSTRATE
摘要 An apparatus for cleaning a substrate is provided to prevent a counter-rotating or an operation stop of a blower by a flowing backward of an air. An apparatus for cleaning a substrate comprises a cleaning processing unit, a blowing member, and a blocking member(566). The cleaning processing unit cleans a substrate. The blowing member forms a descending air current, and supplies an air to the cleaning processing unit. The blocking member blocks a flow of an air flowing backward to the blowing member. The blowing member includes a fan housing(564), a fan(563), and a main housing(562). A top and a bottom of the fan housing are opened. The fan is installed in an inner side of the fan housing. The fan and the fan housing are mounted in the main housing.
申请公布号 KR20090032656(A) 申请公布日期 2009.04.01
申请号 KR20070098074 申请日期 2007.09.28
申请人 SEMES CO., LTD. 发明人 JANG, SUNG HO;LEE, JUNG HWAN
分类号 H05K3/22 主分类号 H05K3/22
代理机构 代理人
主权项
地址