| 摘要 |
A substrate treatment apparatus and a method for supplying chemical of the same are provided to improve the processing efficiency by reducing the turnaround time for the supply and exchange of chemical liquid. A substrate treatment apparatus supplies a plurality of drug solutions to an outer bath(106) in order to process the washing and etching process. The substrate processing apparatus comprises a process bath, a plurality of liquid medicine supply lines(108), a plurality of integrating flow meters(110,112), a level sensor(114), and a controller(102). The process bath comprises an inner bath(104) and the outer bath. The liquid medicine supply line is connected to a plurality of chemical supply sources in order to supply drug solutions to the outer bath. The integrating flow meter is installed in the liquid medicine supply line in order to measure the capacity of supply of the supplied drug solution on a real time basis. The level sensor is installed in one side of the outer bath in order to measure the water level of the drug solution. The controller controls all operations of the substrate processing apparatus.
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