| 摘要 |
<p>A method (400) makes a discrete adjustment to static alignment of a laser beam in a machine (500, 700A, 700B, 700C, 800, 1000) for selectively irradiating conductive links on or within a semiconductor substrate (240) using the laser beam. The laser beam propagates along a beam path (510, 640, 710) having an axis (650) extending from a laser to a laser beam spot (110, 610) at a location on or within the semiconductor substrate (240). The method (400) generates (420), based on at least one measured characteristic of the laser beam, at least one signal to control an adjustable optical element (555, 560, 720, 730, 744, 746, 836, 838, 840, 854, 860, 225) of the machine (500, 700A, 700B, 700C, 800, 1000) effecting the laser beam path (510, 640, 710). The method (400) also sends (430) said at least one signal to the adjustable optical element (555, 560, 720, 730, 744, 746, 836, 838, 840, 854, 860, 225). The method (400) then adjusts (440) the adjustable optical element (555, 560, 720, 730, 744, 746, 836, 838, 840, 854, 860, 225) in response to said at least one signal so as to improve static alignment of the laser beam path axis (650).</p> |
