| 发明名称 |
COMPOSITIONS SUITABLE FOR REMOVING PHOTORESIST, PHOTORESIST BYPRODUCTS AND ETCHING RESIDUE, AND USE THEREOF |
| 摘要 |
<p>Compositions containing certain amines and/or quaternary ammonium compounds, hydroxylamine, corrosion inhibitor, organic diluent and optionally water are capable of removing photoresist, photoresist byproducts and residue and etching residues from a substrate.</p> |
| 申请公布号 |
EP1627259(A4) |
申请公布日期 |
2009.04.01 |
| 申请号 |
EP20040753146 |
申请日期 |
2004.05.24 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
RIEKER, JENNIFER, M.;WIEDER, THOMAS;DURHAM, DANA, L. |
| 分类号 |
G03F7/26;B08B3/14;B08B7/00;C11D9/00;G03F7/30;G03F7/32;G03F7/42;H01L21/306;H01L21/311;H01L21/3213 |
主分类号 |
G03F7/26 |
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