| 摘要 |
A box cleaner for cleaning a wafer shipping box is provided to prevent the generation of the secondary pollution by summarily performing all processes. An accommodation space of an ultrasonic clean bath(101) is filled with the deionized water. A shipping box(10) loaded in a tray(102) is washed by the deionized water. An ultrasonic generator(105) is installed at the lower part of the ultrasonic clean bath. The ultrasonic generator irradiates the ultrasonic wave of 40kHz onto the dipped shipping box in order to remove the micro particle. Elevating mechanisms(103,104) comprises a power conversion tool including a gear assembly, a roller, and a pulley; a driving motor connected to the power conversion tool. A gas jet part(106) drains the deionized water in the shipping gas by spraying the high purity gas to the inside of the shipping box.
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