发明名称 ELECTROLESS GOLD PLATING SOLUTION AND METHOD FOR ELECTROLESS GOLD PLATING
摘要 <p>The present invention is aimed to provide an electroless gold plating solution which requires less amount of a reducing agent, retains a sufficient deposition rate for a practical use, and has an excellent stability as a plating solution; and a method for carrying out an electroless gold plating. The present invention provides an electroless gold plating solution comprising a gold salt, a phenyl compound based reducing agent and a water-soluble amine and a method for plating using the gold plating solution. <IMAGE></p>
申请公布号 EP1338675(A4) 申请公布日期 2009.04.01
申请号 EP20010965688 申请日期 2001.09.18
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 TAKAHASHI, AKIO;YAMAMOTO, HIROSHI;NAKAJIMA, SUMIKO;HASEGAWA, KIYOSHI;MURAKAMI, KANJI
分类号 C23C18/44;(IPC1-7):C23C18/44 主分类号 C23C18/44
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