| 摘要 |
<p>A lithographic apparatus and a method of cleaning a lithographic apparatus are provided to stabilize the process environment of lithographic process by removing the foreign material positioned at the neighboring of substrate. A lithography apparatus comprises a substrate table(W), a hole in the substrate table(WT) and a supplying apparatus of cleaning chemical. The substrate table fixes the substrate. The hole in the substrate table is connected to an inlet port(122) providing the cleaning solution. The supplying apparatus of cleaning chemical supplies the cleaning solution to the peripheral area of hole in the substrate table through the inlet port.</p> |
