SUBSTRATE PROCESSING APPARATUS

摘要

A substrate processing apparatus is provided to rapidly perform the substrate conveyance action by arranging the second placement part effectively. A substrate processing apparatus(1) washes an plurality of substrates accepted in the FOUP(Front Opening Unified Pod)(80) through a scrubbing mode. The substrate processing apparatus comprises an indexer cell(ID) and a rinsing treatment cell(SP). The indexer cell and the rinsing treatment cell are side by side installed at the substrate processing apparatus. A barrier rib(200) for shielding an atmosphere is installed between the indexer cell and the rinsing treatment cell. A substrate correspondence part(50) is installed through a part of the barrier rib for shielding an atmosphere. The substrate processing apparatus comprises a controller(c). The controller controls the indexer cell and the rinsing treatment cell. Each of the rinsing treatment cell and the indexer cell comprise the functional unit. The functional unit is electrically connected with the controller.