| 摘要 |
<p>A resist composition is provided to ensure good barrier capacity for water and to solve the droplet residue dud to high receding contact angle for water. A resist composition comprises a polymer as base resin improving and degrading the solubility in alkali by acids; and a polymer having repeating units represented by the chemical formula 1 as a polymeric additive. In the chemical formula 1, R^1 shows fluorine atom or trifluoromethyl group; R^2 and R^3 are hydrogen atom or C1-20 linear, branched or cyclic alkyl group; R^4 is hydrogen atom or acid-liable group; R^5-R^8 are hydrogen atom, fluorine atom, or C1-20 linear, branched or cyclic alkyl group; m is 0 or 1; and 0.2<=a<=0.8, 0.1<=b<=0.6.</p> |
