发明名称 Self-cooling gas delivery apparatus under high vacuum for high density plasma applications
摘要 A gas distributor for use in a semiconductor processing chamber is provided. The gas distributor comprises a gas inlet, a gas outlet, and a stem section having a spiral thread. The gas distributor further comprises a body having a gas deflecting surface that extends radially outward away from the stem section and a lower face disposed on the opposite side of the body from the gas deflecting surface, a lateral seat disposed between the spiral thread and the gas deflecting surface, and a gas passageway that extends from the gas inlet through the stem section and body to the gas outlet. In a specific embodiment, the lateral seat is adapted to hold a sealing member.
申请公布号 US7510624(B2) 申请公布日期 2009.03.31
申请号 US20040016166 申请日期 2004.12.17
申请人 APPLIED MATERIALS, INC. 发明人 LIANG QIWEI;LU SIQING
分类号 H01L21/306;C23C16/00;C23C16/455 主分类号 H01L21/306
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