APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE

摘要

An apparatus for and method of processing substrate is provided to suppress the processing liquid from being mixed in the inner bath by forming the groove portion at the sidewall of the inner bath. The groove portion(14) is formed in sidewalls(112a, 112b) of the inner bath(11). Hydrofluoric acid solution is discharged from the discharge nozzle(13) towards the groove portion. The discharged hydrofluoric solution is diffused in the groove portion. Therefore, the metallic component or the foreign material is not agitated in the inside of the inner bath. The metallic component or the foreign material is rapidly ejected with the hydrofluoric solution to the outer container(12).