LASER DRILLED SURFACES FOR SUBSTRATE PROCESSING CHAMBERS

摘要

A SUBSTRATE [110] PROCESSING CHAMBER [100] HAS A COMPONENT HAVING A SURFACE THAT IS EXPOSED INSIDE THE CHAMBER [100]. THE EXPOSED SURFACE CAN HAVE A PATTERN OF RECESSES THAT ARE SPACED APART FROM ONE ANOTHER, EACH RECESS HAVING AN OPENING, SIDEWALLS [130], AND A BOTTOM WALL [135]. THE RECESSES ARE FORMED BY DIRECTING A PULSED LASER BEAM ONTO A POSITION ON A SURFACE OF THE STRUCTURE FOR A TIME SUFFICIENTLY LONG TO VAPORIZE A PORTION OF THE STRUCTURE AT THAT POSITION. THE COMPONENT CAN ALSO BE A GAS DISTRIBUTOR HAVING AN ENCLOSURE WITH PLURALITY OF LASER DRILLED GAS OUTLETS [265] HAVING FIRST AND SECOND OPENINGS WITH DIFFERENT DIAMETERS TO REDUCE AN INGRESS OF A PLASMA INTO THE ENCLOSURE. THE LASER DRILLED GAS OUTLETS [265] CAN ALSO HAVE ROUNDED EDGES.