发明名称 |
Three-dimensional shape measuring unit, processing unit, and semiconductor device manufacturing method |
摘要 |
A semiconductor device manufacturing technique measures simultaneously a plurality of points on a sample to realize a high-speed three-dimensional shape measurement and reflects it to setting of a processing condition in a semiconductor device process, thereby making it possible to realize stable device manufacture with high precision. A three-dimensional shape measuring apparatus loaded on a processing apparatus such as an etcher, a coater-developer, a baking machine, or a lithography machine measures a plurality of points (500) on a sample (300) at high speed by arranging a plurality of measurement heads (100) for measuring a three-dimensional shape of the sample and by combining it with movement of an loader/stage (200) loading the sample (300). By using this measurement result, feeding back for correcting a processing condition with respect to the subsequent sample (300) and feeding forward for correcting a processing condition in the next step are realized.
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申请公布号 |
US7511828(B2) |
申请公布日期 |
2009.03.31 |
申请号 |
US20040562207 |
申请日期 |
2004.06.24 |
申请人 |
HITACHI, LTD. |
发明人 |
WATANABE MASAHIRO;NAKATA TOSHIHIKO;TANAKA MAKI |
分类号 |
G01B11/24;G01B21/20;G01Q10/02;G01Q30/02;G01Q30/04;G01Q60/24;G01Q70/06;G02B15/04;G02B21/30;H01L21/00 |
主分类号 |
G01B11/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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