发明名称 SEMICONDUCTOR ON INSULATOR SUBSTRATE AND DEVICES FORMED THEREFROM
摘要 <p>SEMICONDUCTOR ON INSULATOR SUBSTRATE AND DEVICES FORMED THEREFROM A semiconductor on insulator (SOI) device is comprised of a layer of a dielectric material (52) having a perovskite lattice, such as a rare earth scandate. The dielectric material (52) is selected to have an effective lattice constant that enables growth of semiconductor material (54) having a diamond lattice directly on the dielectric (52). Examples of the rare earth scandate dielectric include gadolinium scandate (GdScO3), dysprosium scandate (DyScO3), and alloys of gadolinium and dysprosium scandate (Gdl-x,Dyx,Sc03).</p>
申请公布号 SG150556(A1) 申请公布日期 2009.03.30
申请号 SG20090014333 申请日期 2005.03.28
申请人 ADVANCED MICRO DEVICES, INC. 发明人 XIANG, QI
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