| 摘要 |
A normal pressure drying device, a substrate processing apparatus and a substrate processing method are provided to prevent the generation of the drying stain by using the front surface cooling unit and the rear surface heating unit. The flat transfer module transfers the processed substrate on the predetermined carrier path. Among the transfer by the flat, the rear surface heating part(128) heats up the coating film on the processed substrate from the backside of substrate. At this time, the coating film is heated in the temperature higher than the room temperature. Among the transfer by the flat, the surface cooling part(130) cools the surface of the coating film on the processed substrate from the opposite side of the rear surface heating part. At this time, the coating film is cooled in the temperature lower than the room temperature.
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