发明名称 |
Reactive Ion Etching Process for Etching Metals |
摘要 |
A method of etching a metal by a reactive ion etching process is provided. The etchant gas chemistry for the reactive ion etching process consists essentially of NH3. The process is particularly suitable for etching superalloys, which etch only slowly using conventional metal etching techniques.
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申请公布号 |
US2009078674(A1) |
申请公布日期 |
2009.03.26 |
申请号 |
US20070861282 |
申请日期 |
2007.09.26 |
申请人 |
SILVERBROOK RESEARCH PTY LTD |
发明人 |
MCREYNOLDS DARRELL LARUE;C.S. LAKSHMI;SILVERBROOK KIA |
分类号 |
C03C25/68;C23F1/00;G01D15/00 |
主分类号 |
C03C25/68 |
代理机构 |
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地址 |
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