发明名称 Method and Apparatus for Spacer-Optimization (S-O)
摘要 The invention can provide a method of processing a substrate using S-O processing sequences and evaluation libraries that can include one or more optimized spacer creation and evaluation procedures.
申请公布号 US2009081815(A1) 申请公布日期 2009.03.26
申请号 US20070859507 申请日期 2007.09.21
申请人 TOKYO ELECTRON LIMITED 发明人 YAMASHITA ASAO;FUNK MERRITT;PRAGER DANIEL J.;CHEN LEE;SUNDARARAJAN RADHA
分类号 H01L21/311 主分类号 H01L21/311
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