发明名称 PHOTOSETTING HYDROPHILIC COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosetting hydrophilic composition having high time stability and can be suitably used for producing a hydrophilic member having excellent scratch resistance, storage stability and planar property. SOLUTION: The photosetting hydrophilic composition comprises (A) a hydrophilic polymer having one or more hydrolyzable silyl groups in one molecule and (B) a photoacid generator generating a Bronsted acid or a Lewis acid by the action of active energy ray. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009062463(A) 申请公布日期 2009.03.26
申请号 JP20070231908 申请日期 2007.09.06
申请人 FUJIFILM CORP 发明人 FUKUDA MAKOTO;HOSHI SATOSHI
分类号 C08L101/10 主分类号 C08L101/10
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