发明名称 |
NEUTRAL LIGAND CONTAINING PRECURSORS AND METHODS FOR DEPOSITION OF A METAL CONTAINING FILM |
摘要 |
<p>Methods and compositions for depositing metal films are described herein. In general, the disclosed methods utilize precursor compounds comprising gold, silver or copper. More specifically, the disclosed precursor compounds utilize neutral ligands derived from ethylene or acetylene.</p> |
申请公布号 |
WO2009039216(A1) |
申请公布日期 |
2009.03.26 |
申请号 |
WO2008US76732 |
申请日期 |
2008.09.17 |
申请人 |
L'AIR LIQUIDE - SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE;JURCIK, BENJAMIN;DUSSARRAT, CHRISTIAN |
发明人 |
JURCIK, BENJAMIN;DUSSARRAT, CHRISTIAN |
分类号 |
C23C16/18;C07F1/08;C07F1/10;C07F1/12;C07F7/08;C23C16/455 |
主分类号 |
C23C16/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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