| 摘要 |
PROBLEM TO BE SOLVED: To provide: a substrate processing apparatus which copes with small batches to reduce the cost; a substrate processing method using the same; and a method for manufacturing a semiconductor device. SOLUTION: A pod opener 21 opening/closing a cap of a pod 26 is installed in a front lower part of a housing 2 of a batch-type CVD system 1, and first and second pod stages 24 and 25 are installed at left and right sides of a pod loading port 22 of the pod opener 21, respectively. A pod carrying device 30 which carries the pod 26 between the pod opener 21 and the pod stages 24 and 25 with a handle 28 clamped by clamping elements 53 and 50 is installed above the pod opener 21 and both pod stages 24 and 25. Since pods are directly carried between the pod stages and the pod opener by the pod carrying device, shelves for temporary storage of the pods can be omitted to reduce the initial cost and the running cost of a small batch-type CVD system. COPYRIGHT: (C)2009,JPO&INPIT
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