PHOTOSTABILIZED POLYPROPYLENE

摘要

The invention provides a polypropylene resin composition which little gives out volatile organic compounds and is excellent in thermal stability, photodegradation resistance and processability in molding and moldings of the composition. The composition comprises both 100 parts by weight of a propylene block copolymer (A) and 0.05 to 5 parts by weight of a hindered amine photostabilizer (B) satisfying the following requirements (a), (b) and (c) and exhibits a melt flow rate of 5 to 200g/10min at 230°C: requirement (a): having a 2,2,6,6-tetramethylpiperidyl group, requirement (b): exhibiting an acid dissociation constant (pka) of less than 8, requirement (c): exhibiting a weight loss of less than 10% on heating from 25°C to 300°C at a temperature rise rate of 10°C/min in a nitrogen atmosphere.