发明名称 THIN FILM TRANSISTOR AND MANUFACTURING METHOD OF DISPLAY DEVICE HAVING THIN FILM TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor having excellent electrical characteristics, and high reliability, and a display device having it. SOLUTION: A gate insulating film is formed on a gate electrode, a microcrystal semiconductor film containing a metallic element is formed on the gate insulating film, and thereby crystallinity on the interface between the gate insulating film and the microcrystal semiconductor film containing the metallic element is raised. The microcrystal semiconductor film containing the metallic element of which crystallinity on the interface between itself and the gate insulating film is raised is used as a channel forming region to form this thin film transistor. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009065032(A) 申请公布日期 2009.03.26
申请号 JP20070232664 申请日期 2007.09.07
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
代理机构 代理人
主权项
地址
您可能感兴趣的专利