SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which a transfer chamber is automatically purged by means of inert gas. SOLUTION: The substrate processing apparatus includes a controller that performs control so that the transfer chamber 102 connected to a processing chamber 202 for processing a substrate is purged by gas, the controller having a switching unit that switches a function of exhausting the gas in the transfer chamber 102 in one direction, and a function of circulating the gas through the transfer chamber 102 in an inert gas atmosphere. COPYRIGHT: (C)2009,JPO&INPIT