| 发明名称 |
POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREATED WITH AN AMINOSILANE |
| 摘要 |
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier, a cationic polymer, an acid, and abrasive particles that have been treated with an aminosilane compound.
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| 申请公布号 |
US2009081871(A1) |
申请公布日期 |
2009.03.26 |
| 申请号 |
US20080234173 |
申请日期 |
2008.09.19 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
DYSARD JEFFREY;ANJUR SRIRAM;GRUMBINE STEVEN;WHITE DANIELA;WARD WILLIAM |
| 分类号 |
H01L21/304;C09K3/14 |
主分类号 |
H01L21/304 |
| 代理机构 |
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代理人 |
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