| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a defect correction method for a photomask using a scanning probe microscope, the method giving less damage on the photomask, and to provide a method for manufacturing a photomask using the method. <P>SOLUTION: The defect correction method for a photomask having a defective portion on a substrate is characterized in that the defective portion is removed with a probe of a scanning probe microscope while supplying a decomposition and dissolving chemical liquid that decomposes or dissolves the defective portion to the defective portion or supplying a pH adjusting chemical liquid the pH of which is adjusted to render the zeta potential of the defective portion into the same sign as the zeta potential of the substrate. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
