| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a transparent gas barrier film, in which a vacuum deposition method is adopted and by which the transparent gas barrier film having both colorless transparency and gas barrier property is produced. SOLUTION: The method for producing the transparent gas barrier film comprises depositing a silicon oxide film 1 on at least one surface of a transparent polymer film base material 2 in a vacuum atmosphere by a vapor deposition method. The method has at least a transparent polymer film base material, a vapor deposition material arranged at a position opposite to the transparent polymer film base material, a heating means for heating the vapor deposition material, and a gas jet means for jetting a gas to an evaporated vapor deposition material. In the method, the vapor deposition material is a silicon oxide material and the gas is an organic silicon compound. COPYRIGHT: (C)2009,JPO&INPIT
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