| 摘要 |
Disclosed is a photosensitive composition which enables to obtain good pattern shape and line-edge roughness in normal exposure (dry exposure), liquid immersion exposure and double exposure. Also disclosed are a pattern-forming method using such a photosensitive composition and a compound used in such a photosensitive composition. Specifically disclosed is a photosensitive composition characterized by containing a resin (A) containing a repeating unit corresponding to a compound represented by the general formula (I) below, which resin produces an acid group when irradiated with active ray or radiation. In the general formula (I), Z represents a group from which a cation is removed upon irradiation of active ray or radiation, thereby forming an acid group; A represents an alkylene group; X represents a single bond or a divalent linking group having a heteroatom; B represents a single bond, an oxygen atom or -N(Rx)-, and Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y, and Y represents a polymerizable group. When B is -N(Rx)-, R and Rx may combine together to form a ring. |
