DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE

摘要

In the case of forming a switching element and an optical sensor element on the same substrate, when the film thickness of an active layer is increased to improve sensitivity of the optical sensor element, characteristics of the switching element (TFT) are affected. A display device is provided with a channel layer (25) and a photoelectric conversion layer (35) on a gate insulating film (24) of a glass substrate (5) whereupon a plurality of pixels are arranged in matrix. The channel layer configures a thin film transistor to be a pixel switching element. The photoelectric conversion layer configures an optical sensor element. The light absorptance of the photoelectric conversion layer (35) is permitted to be higher than that of the channel layer (25) by forming the photoelectric conversion layer (35) thicker than the channel layer (25) or by forming the photoelectric conversion layer (35) of a material different from that of the channel layer (25).