| 摘要 |
Provided is an Al-Ni alloy sputtering target by which generation of arcing during sputtering is suppressed. The Al-Ni-B alloy sputtering target contains Ni and B, and has Al3Ni compound deposited. The ratio of the Al3Ni compound containing B-containing particles to the total deposition quantity of the Al3Ni compound is 2% or more, and the average particle diameter of the Al3Ni compound is 20mum or less.
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