| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new polymer compound, to provide a positive resist composition containing the polymer, and to provide a resist pattern formation method using the positive resist composition. <P>SOLUTION: Provided is a polymer compound having a constituent unit (a0) represented by general formula (a0-1) (wherein, R<SP>1</SP>is an acid-dissociable dissolution-inhibiting group) and a constituent unit (a1) which is derived from an acrylic ester containing an acid-dissociable dissolution-inhibiting group and does not correspond to the constituent unit (a0). <P>COPYRIGHT: (C)2009,JPO&INPIT |
