发明名称 |
Polishing slurries and methods for utilizing same |
摘要 |
A polishing slurry includes liquid medium and particulate abrasive. The particulate abrasive includes soft abrasive particles, hard abrasive particles, and colloidal silica particles, wherein the soft abrasive particles have a Mohs hardness of not greater than 8 and the hard abrasive particles have a Mohs hardness of not less than 8, and wherein the soft abrasive particles and the hard abrasive particles are present at a weight ratio of not less than 2: 1. |
申请公布号 |
ZA200802782(B) |
申请公布日期 |
2009.03.25 |
申请号 |
ZA20080002782 |
申请日期 |
2008.03.28 |
申请人 |
SAINT-GOBAIN CERAMICS & PLASTICS, INC. |
发明人 |
LACONTO, RONALD W;HAERLE, ANDREW G |
分类号 |
C09G;H01L |
主分类号 |
C09G |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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