CLEAING SOLUTION FOR IMMERSION PHOTOLITHOGRAPHY SYSTEM AND IMMERSION PHOTOLITHOGRAPHY PROCESS

摘要

A cleaning solution for an immersion photolithography system is provided to increase production yield by preventing a wafer from being contaminated a next wafer in immersion photolithography process. An immersion photolithography system is exposed to the outside through a plurality of wafer immersion mediums. An exposure process is interrupted after a predetermined cycle. The immersion photolithography system cleaning the region contacted with the wafer immersion medium with a cleaning solution. The cleaning process removes a contaminant by flowing the cleaning solution for a predetermined time and also includes a rinsing the contact region.