发明名称 Method of forming semiconductor chip wiring pattern using alignment marks
摘要 <p>Alignment patterns are formed in scribe regions of a semiconductor substrate (21), and through grooves for exposing the scribe regions are disposed in an insulating layer (13) formed on the semiconductor substrate. Formation positions of wiring patterns (14) are aligned based on the alignment patterns, and a metal layer is patterned and the wiring patterns (14) are formed.</p>
申请公布号 EP2040288(A2) 申请公布日期 2009.03.25
申请号 EP20080164617 申请日期 2008.09.18
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 MACHIDA, YOSHIHIRO
分类号 H01L21/60;H01L23/544 主分类号 H01L21/60
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