发明名称 Substrate holding technique
摘要 A stage system includes a fine-motion stage on which a substrate holding member for holding a substrate is mounted, a rough-motion stage on which the fine-motion stage is mounted, a stage for supporting and moving a substrate, and a probe configured to measure a potential of the substrate without contact thereto, the probe being supported by the rough-motion stage so as to be opposed to one of a bottom face and a side face of the substrate.
申请公布号 US7508646(B2) 申请公布日期 2009.03.24
申请号 US20040879074 申请日期 2004.06.30
申请人 CANON KABUSHIKI KAISHA 发明人 EMOTO KEIJI;ITO ATSUSHI
分类号 H01T23/00;G03F7/20;G03F9/00;H01L21/027;H01L21/683 主分类号 H01T23/00
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