| 摘要 |
A patterning method and a display device are provided to perform high precision pattering by performing a wet etching using the etchant of the weak acid or the weak base. The gas barrier layer comprises with at least one inorganic region and at least one organic region. The pKa of the weak acid or the weak base contained in the etchant is in range of 0.5 ~ 10. The etchant is selected among the oxalic acid solution, the acetate solution, the carbonate solution and phosphoric acid and their mixture of two or more kinds. The etchant is made of the aqueous solution of oxalic acid. The substrate for the display device has the transparent electrode. The substrate for the display device has the cathode film layer. The cathode film layer is patterned. |
