发明名称 METHOD AND APPARATUS OF MANUFACTURING IC DEVICE
摘要 A method and apparatus of manufacturing IC device is provided to allow a user to mange the state of unit by confirming current state of the units more accurately. A manufacturing device(100) of the micro-patterning circuit device includes a first unit(10a), a second unit(10b), a third unit.(10c), and fourth unit(10d). The manufacturing device of the micro-patterning circuit device comprises the first display(12) and the second display unit(14). The first display indicates the current state of the fourth unit through the first by the single unit. The first display comprises the member like a monitor, and the second display unit is the current state about the fourth unit through the first the display to the discrete unit.
申请公布号 KR20090029863(A) 申请公布日期 2009.03.24
申请号 KR20070095009 申请日期 2007.09.19
申请人 SEMES CO., LTD. 发明人 JEON, YUN SEOK;SEO, KANG YOUNG
分类号 H01L21/02 主分类号 H01L21/02
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