发明名称 Method for producing electron beam apparatus
摘要 In a producing method for an electron beam emitting device, a position of a stray emission source constituting an unnecessary electron emitting part on a cathode substrate is detected, and an energy is locally applied to the detected position thereby eliminating the stray emission source, thereby providing an excellent electron beam apparatus without a deterioration in a constituent member or a trouble by an accidental discharge.
申请公布号 US7507134(B2) 申请公布日期 2009.03.24
申请号 US20050229633 申请日期 2005.09.20
申请人 CANON KABUSHIKI KAISHA 发明人 IBA JUN;AZUMA HISANOBU
分类号 H01J9/50;H01J9/42 主分类号 H01J9/50
代理机构 代理人
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