| 摘要 |
An apparatus of treating a substrate is provided to isolate a fume generated a solution process bath from a solution process bath by generating a strong air current from upper part to a lower part. A plurality of solution process baths(110) is arranged in order, and an etching, cleaning, drying at each solution process bath. The each solution has at leas one bath(112) and has an open upper part while being filled with a solution for the etching and a cleaning. A transfer robot transfers a substrate between baths. An air purification unit(120) corresponds to the solution process bath and has a filter(122) and a exhaust line(124). An air current generating unit(130) is installed between solution process baths.
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