发明名称 |
Exposure apparatus and device manufacturing method |
摘要 |
An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes: a liquid supply mechanism that has a supply port arranged to oppose a surface of the substrate; and a buffer space formed in a channel of the liquid supply mechanism; wherein the liquid is supplied to the supply port after reserving a prescribed amount or more of liquid in the buffer space.
|
申请公布号 |
US7508490(B2) |
申请公布日期 |
2009.03.24 |
申请号 |
US20060325474 |
申请日期 |
2006.01.05 |
申请人 |
NIKON CORPORATION;NIKON ENGINEERING CO., LTD. |
发明人 |
NAGASAKA HIROYUKI;OKUYAMA TAKESHI |
分类号 |
G03B27/42;G03B27/52;G03F7/20 |
主分类号 |
G03B27/42 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|