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发明名称
Method of forming a spacer in semiconductor device
摘要
申请公布号
KR100889552(B1)
申请公布日期
2009.03.23
申请号
KR20070062847
申请日期
2007.06.26
申请人
发明人
分类号
H01L29/78;H01L21/31
主分类号
H01L29/78
代理机构
代理人
主权项
地址
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