Chemically Amplified Positive Resist Composition and Patterning Process,申请号KR20050031059-传众专利搜索

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发明名称	Chemically Amplified Positive Resist Composition and Patterning Process
摘要
申请公布号	KR100889197(B1)	申请公布日期	2009.03.17
申请号	KR20050031059	申请日期	2005.04.14
申请人		发明人
分类号	G03F7/004;G03F7/039;C08F212/14;C08F220/10;G03C1/492;H01L21/027	主分类号	G03F7/004
代理机构		代理人
主权项
地址

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