发明名称 PRECURSOR COMPOSITION FOR POROUS MEMBRANE, PROCESS FOR PREPARATION OF THE PRECURSOR COMPOSITION, POROUS MEMBRANE, PROCESS FOR PRODUCTION OF THE POROUS MEMBRANE, AND SEMICONDUCTOR DEVICE
摘要 <p>a compound selected from a compound represented by the formula: Si(OR1)4 and a compound represented by the formula: Ra(Si)(OR2)4-a (in the formulae, R1 represents a univalent organic group; R represents a hydrogen atom, a fluorine atom or a univalent organic group; R2 represents a univalent organic group; and a represents an integer ranging from 1 to 3, provided that R, R1 and R2 are the same as or different from one another); a thermally degradable organic compound; an element having a catalytic activity; urea; and the like. A porous membrane produced from the precursor composition is irradiated with ultraviolet ray, and then subjected to gas-phase reaction with a hydrophobic compound. A porous membrane thus prepared can be used for the manufacture of a semiconductor device.</p>
申请公布号 KR20090027675(A) 申请公布日期 2009.03.17
申请号 KR20087031601 申请日期 2007.05.16
申请人 ULVAC, INC. 发明人 FUJII NOBUTOSHI;NAKAYAMA TAKAHIRO;KOHMURA KAZUO;TANAKA HIROFUMI
分类号 C08J9/36;C08G77/18;C08J9/22;H01L21/312 主分类号 C08J9/36
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